Expertise in EUV
Extremely low HSFR
For beyond EUV optics, high-spatial-frequency roughness (HSFR) must be low to improve damage tolerance and prevent scattering. Using our proprietary technology, we can offer extremely low HSFR surfaces characterized by
- RMS down to 0.1 nm and below.
- Free form including off-axis ellipsoid.
- Material from Si, fused silica, CaF2 and others.
- Qualified by white light interferometer and AFM.
MSFR below 0.10 nm
Roughness in the spatial frequency range of
1/0.01—1 mm-1 is defined as mid-spatial-frequency roughness (MSFR). MSFR causes unwanted intensity distribution in beam transportation or focusing. We can provide extremely low MSFR surfaces characterized by
- RMS down to 0.1 nm in an area of
1 × 1 mm².
- Processed by high-spatial-resolution polishing.
- Qualified by white light interferometer.
Our optics are highly regarded in the semiconductor industry for their extremely low MSFR.
LSFR below 3 nm
In EUV and X-ray optics in focusing systems, low spatial frequency roughness (LSFR or “figure error”) is an important factor in achieving small focus sizes. Our free-form optics have extremely low LSFR (best effort: 2—3 nm RMS), which we consider to be the best surface quality in the world.
- RMS down to 2 nm.
- Off-axis ellipsoid, Wolter, and others.
- High-precision enough to use at synchrotron radiation facilities.
We exhibit at trade shows as a place to hear the needs of our overseas customers directly.
We listen carefully and lead the challenge to a breakthrough.
Please feel free to consult with NATSUME about difficulties for which you have not yet found a solution.
We look forward to seeing you at the exhibition.